非织造布表面沉积ZnO薄膜的AFM和透光性分析

运用射频磁控溅射在非织造布基材上生长ZnO纳米结构薄膜。用原子力显微镜(AFM)分析了射频磁控溅射工艺参数(功率、压力、时间)对ZnO透明薄膜微结构的影响,并用分光光度计分析了样品的透光率。结果表明:随着沉积时间的延长,非织造布表面ZnO纳米结构薄膜的致密性、均匀性越来越好;较高的溅射功率加速了晶粒生长,但不易太大;过大的工作气压使ZnO颗粒形状逐渐变差;经ZnO镀层处理的非织造布对紫外光的吸收能力随着镀膜厚度的增加逐渐增强。

AFM and transmittance analysis of nonwovens deposited with ZnO film

A magnetron sputter coating was used in this study to deposit zinc oxide(ZnO) nanostructure film onto the nonwoven substrate.Atomic force microscopy(AFM) was employed to analyze the effect of RF magnetron sputtering parameters (power,pressure,time) on the microstructure of transparent ZnO film built on the nonwoven substrate.The transmittance of samples was examined by an UV/VIS spectrophotometer.The results demonstrated that increasing the coating time increases the evenness and compactness of the film.Higher power used accelerates the growth of the film,however,too high a power is not recommended.Excessive working pressure results in the deformation of the grown ZnO grains on the fiber surface.The nonwoven substrate exhibits much better UV absorption as the coat thickness increases.