| 二氧化硅基波导薄膜的制备方法综述 |
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| 引用本文： | 朱晓辉. 二氧化硅基波导薄膜的制备方法综述[J]. 现代技术陶瓷, 2006, 27(2): 29-31 |
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| 作者姓名： | 朱晓辉 |
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| 作者单位： | 唐山工业职业技术学院,唐山,063020 |
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| 摘 要： | 总结了目前制备二氧化硅基波导薄膜的各种制备工艺，包括广泛采用的等离子增强化学气相沉积法（PECVD）、火焰水解法（FHD）、低压化学气相沉积法、溅射法、离子交换法、离子注入法和溶胶-凝胶法等制备方法，并对各种工艺的原理、特点和应用现状进行了详细的介绍。
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| 关 键 词： | SiO2基波导薄膜 制备方法 |
Typical Fabrication Methods of Silica Based Waveguide Film |
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| Zhu Xiaohui. Typical Fabrication Methods of Silica Based Waveguide Film[J]. Advanced Ceramics, 2006, 27(2): 29-31 |
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| Authors: | Zhu Xiaohui |
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| Affiliation: | Tangshan Industrial Vocation - Technical College, Tangshan 063020 |
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| Abstract: | Several typical fabrication methods of silica based waveguide film, such as plasma enhanced chemical vapor deposition method, the flame hydrolysis method, the low pressure CVD, sputtering, ion exchange, ion implantation, sol - gel method, are reviwed. The processes, characteristics and the application of the methods are also introduced respectively. |
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| Keywords: | silica based waveguide film fabrication method |
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