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单晶硅裂纹尖端的位错发射行为
引用本文:张琼,周海芳. 单晶硅裂纹尖端的位错发射行为[J]. 中国有色金属学报, 2001, 11(5): 815-818
作者姓名:张琼  周海芳
作者单位:1. 福州大学材料学院,
2. 福州大学电子系,
摘    要:利用透射电镜原位观察了单晶硅压痕裂纹尖端位错及位错偶沿滑移面的发射行为,考察了滑移面取向,外荷对发射位错及塑性区的影响,结果表明:在I型载荷作用下,滑移面与裂纹面夹角要影响从裂纹尖端发射的位错数量及塑性区,发射出的位错可沿最大切应力方向改变运动方向或交换滑移面运动,实验观察的位错宽度平均值为22.0nm,与Peierls位移框架模型计算的23.6nm相近。

关 键 词:位错发射 TEM 塑性区 单晶硅 裂纹
文章编号:1004-0609(2001)05-0815-04
修稿时间:2000-10-27

Dislocation emitting behavior from crack tips in single silicon
ZHANG Qiong ,ZHOU Hai fang. Dislocation emitting behavior from crack tips in single silicon[J]. The Chinese Journal of Nonferrous Metals, 2001, 11(5): 815-818
Authors:ZHANG Qiong   ZHOU Hai fang
Affiliation:ZHANG Qiong 1,ZHOU Hai fang 2
Abstract:Dislocation emissions on the slip plane from crack tips in silicon were observed through transmission electron microscopy. The effects of the slip plane orientation and load on dislocation emission or plastic zone have been investigated. The results show that the angle between slip plane and crack plane has an effect on dislocation structure and plastic zone under the I mode load, and the direction of the movement of dislocation emission may change along the direction of the maximum shear stress, or move in zigzag on different slip planes alternatively. The experimental average 22.0?nm of dislocation width approximates to 23.6?nm calculated by Peierls dislocation model.
Keywords:dislocation emission  behavior  plastic zone
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