aInstitute of Physics, Wrocław University of Technology, 50-370 Wrocław, Wybrzeże Wyspiańskiego 27, Poland
bFaculty of Fundamental Problems of Technology, 50-370 Wrocław, Wybrzeże Wyspiańskiego 27, Poland
Abstract:
Theoretical and experimental studies of a double layer antireflection coating deposited onto silicon wafers have been carried out. Magnesium oxide and cerium oxide fabricated by physical vapor deposition method have been applied as low- and high-refractive index materials. MgF2–CeO2–Si structures exhibited the reflectivity below 3% in the wavelength window from 0.5 μm to 1.2 μm. Theoretical simulations of spectral characteristics of the reflectivity of these coatings have been performed. A good correlation between experimental data and theoretical curves has been observed with the assumption that a thin SiO2 layer of a thickness of 16 nm is formed onto Si substrates.