Oxidation Behavior of Silicon Yttrium Oxynitride |
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| Authors: | Jean-Bernard Veyret Marcel Van de Voorde Michel Billy |
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| Affiliation: | Institute for Advanced Materials, Commission of the European Communities, Petten, The Netherlands;Laboratoire de Céramiques Nouvelles, University of Limoges, Limoges, France |
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| Abstract: | The oxidation behavior of the silicon yttrium oxynitride Y10Si7O23N4, so-called H-phase, in the temperature range 700–1400°C has been investigated. A nitrogen retention phenomenon in the oxidation product Y4.67(SiO4)3O (O-apatite) is discussed. The H-phase is one of the four quaternary compounds identified in hot-pressed Si3N4 materials fabricated within the Si3N4–SiO2–Y2O3 pseudoternary system. |
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