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Optimization of field emission properties of carbon nanotubes by Taguchi method |
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| Authors: | Jyh-Hua Ting Ching-Chou Chang Duan-Shaw Lu Fuang-Yuan Huang |
| Affiliation: | a National Nano Device Laboratories, No. 26 Prosperity Road I, Science-based Industrial Park, Hsinchu, Taiwan 30078, R.O.C. b Institute of Precision Engineering, National Chung Hsing University, 250, Kuo Kuang Road, Taichung, Taiwan 402, R.O.C. c Department of Mechanical Engineering, National Central University, 300, Jung-da Road, Jung-li City, Taoyuan, Taiwan 320, R.O.C. |
| Abstract: | It is the purpose of this study to evaluate the field emission property of carbon nanotubes (CNTs) prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD) method. Nickel layer of 5 nm in thickness on 20-nm thickness titanium nitride film was transformed into discrete islands after hydrogen plasma pretreatment. CNTs were then grown up on Ni-coated areas by MPCVD. Through the practice of Taguchi method, superior CNT films with very low emission onset electric field, about 0.7 V/μm (at J = 10 μA/cm2), are attained without post-deposition treatment. It is found that microwave power has the most important influence on the field emission characteristics of CNT films. The increase of methane flow ratio will downgrade the degree of graphitization of CNT and thus its field emission characteristics. Scanning electron microscope and transmission electron microscopy (TEM) observation and energy dispersive X-ray spectrometer analysis reveal that CNT growth by MPCVD is based on tip-growth mechanism. TEM micrographs validate the hollow, bamboo-like structure of the multi-walled CNTs. |
| Keywords: | Carbon Raman scattering Chemical vapor deposition (CVD) Field emission |
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