外部磁场对电-磁场协同增强HiPIMS放电及V膜沉积与性能的调制

为了获得新型HiPIMS稳定放电及制备优质膜层时的最优外部磁场参数,研究外部磁场变化对电-磁场协同增强高功率脉冲磁控溅射((E-MF)HiPIMS)放电及沉积特性的调制过程.在其他工艺参数保持不变的情况下,研究了外部磁场(线圈电流)对HiPIMS钒(V)靶放电规律以及V膜微观结构和性能的影响.采用数字示波器监测HiPI...

Modulation of external magnetic field on (EMF) HiPIMS discharge,deposition, and properties of vanadium films

The optimal external magnetic field parameters for stable discharge of a novel HiPIMS and obtaining high-quality film were explored, and the modulation of the external magnetic field on the discharge and deposition characteristics of electro-magnetic fields synergistically enhancing high power impulse magnetron sputtering ((E-MF) HiPIMS) was studied. The effects of coil current of external magnetic field on the discharge of HiPIMS vanadium target as well as the microstructure and properties of vanadium films were investigated. The discharge behavior of HiPIMS was monitored, and the influences of external magnetic field on the phase structure, surface morphology, cross-section morphology, friction and wear resistance, and corrosion resistance of vanadium films were studied by XRD, SEM, AFM, friction and wear tester, and electrochemical corrosion method. Results show that with the increase of the coil current, the substrate ion current increased gradually. When the coil current was 6 A, the maximum substrate ion current density reached 209.2 mA/cm². The phase structure of vanadium film was only V (111), but the intensity of its diffraction peak increased with the increase of coil current. The surface of vanadium film exhibited typical round-pit shape. The surface roughness decreased first and then increased, and the minimum was only 10 nm. At low coil current (<4 A), the vanadium film showed a compact and fine crystal growth structure. With the increase of coil current, the deposition rate of the film increased gradually. When the coil current was 4 A, the friction coefficient of the vanadium film was the smallest, the wear resistance was the best, and the vanadium film samples had the best corrosion resistance.