High resolution photolithography for direct view active matrix organic light‐emitting diode augmented reality displays |
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| Authors: | Paweł E. Malinowski Tung‐Huei Ke Atsushi Nakamura Ya‐Han Liu Dieter Vander Velpen Erwin Vandenplas Nikolas Papadopoulos Auke Jisk Kronemeijer Jan‐Laurens van der Steen Soeren Steudel Che‐Cheng Kuo Yen‐Yu Huang Yu‐Hsien Chen Ming‐Hua Yeh Gerwin Gelinck Paul Heremans |
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| Affiliation: | 1. IMEC, Leuven, Belgium;2. FUJIFILM Electronic Materials (EUROPE) N.V, Zwijndrecht, Belgium;3. TNO/Holst Centre, AE Eindhoven, The Netherlands;4. Chungwha Picture Tubes, LDT, Bade City, Taoyuan, Taiwan |
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| Abstract: | High‐resolution RGB organic light‐emitting diode frontplane is a key enabler for direct‐view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi‐transparent active displays. Organic light‐emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit). |
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| Keywords: | RGB OLED photolithography AMOLED display ultra‐high resolution |
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