Influence of Sputtering Pressure on the Structure and Mechanical Properties of Nanocomposite Ti-Si-N Thin Films |
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| Authors: | Vipin Chawla R Jayaganthan Ramesh Ch ra |
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| Affiliation: | Vipin Chawla1,2),R. Jayaganthan1) and Ramesh Chandra2) 1) Department of Metallurgical and Materials Engineering & Centre of Nanotechnology,Indian Institute of Technology Roorkee,Roorkee 247667,India 2) Nano Science Laboratory,Institute Instrumentation Centre,India |
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| Abstract: | Nanocomposite Ti-Si-N thin films have been deposited on Si (100) substrate by direct current/radio frequency (DC/RF) magnetron sputtering. The effect of varying deposition parameters on the structure and mechanical properties of Ti-Si-N films has been investigated by characterization techniques such as X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and nanoindentation, respectively. XRD analysis of the thin films exhibit all (111), (200) and (220... |
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| Keywords: | Ti-Si-N films Nanoindentation Microstructural characterization |
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