Reaction Phases and Strength of AlN/V Diffusion Couples

Diffusion couples of AlN/V were experimentally examined after annealing in a temperature range of 1373 K1773 K for a bonding time range of 0.9 ks21.6 ks. The interfacial reaction, reaction mechanism, and bond strength of the bonded AlN/V couples have been explained on the basis of phase relations at different bonding conditions, making use of elemental analysis, XRD, and shear testing method. Formation of V(Al) solid solution and V₂N nitride controls the interfacial joining of the AlN/V couples. A complete diffusion path between AlN and V could be predicted at 1573 K before 0.9 ks, following a sequence of AlN/V(Al)/V₂N/V. This sequence can be discussed during the Al-V-N ternary phase diagram. At a high temperature of 1573 K, AlN decomposition at the interface took place. A maximum bond strength could be obtained for a joint bonded at 1573 K after 5.4 ks, having a structure of AlN/V(Al)/V₂N + V.