Characteristics of the etching of undoped silica in MCVD-fabricated optical fibers with buffered hydrofluoric acid |
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| Authors: | S. Hopland |
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| Affiliation: | Division of Physical Electronics The University of Trondheim The Norwegian Institute of Technology N-7034 Trondheim - NTH, Norway |
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| Abstract: | The etching reaction between the undoped silica cladding in MCVD-fabricated fibers and buffered hydrofluoric acid (BHF) has been studied by examining the outer diameter decrease of the fibers in a given etching time. The study has revealed that the etching reaction is not diffusion limited. The etch rate is determined and compared with values published for SiO2 - films. We have also determined the activation energy of the process, which agrees well with values reported for SiO2 - films. |
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| Keywords: | Etching silica optical fibers |
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