Development of compatible wet-clean stripper for integration of CoWP metal cap in Cu/low-k interconnects |
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Authors: | Aiping Wu Eugene Baryschpolec Matthias Schaller Susanne Leppack |
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Affiliation: | a Air Products and Chemicals, Inc., 7201 Hamilton Boulevard, Allentown, PA 18195-1501, USA b GLOBALFOUNDRIES Dresden Module Two GmbH & Co. KG, Wilschdorfer Landstraβe 101, 01109 Dresden, Germany |
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Abstract: | Implementation of CoWP metal caps into Cu/low-k integration schemes requires a wet stripper that not only gives efficient cleaning but also has good compatibility to CoWP and low-k dielectrics. This paper describes a novel non-fluoride CoWP compatible stripper, developed based on a systematic study of the effect of stripper components, i.e. solvent, corrosion inhibitor, and stripper pH. Electrochemical methods were used to characterize galvanic corrosion of the CoWP/Cu couple and to estimate CoWP etch rate. Our studies showed that a traditional fluoride stripper caused severe damage to CoWP capping layer. The new stripper achieved a good balance between cleaning efficiency and compatibility to CoWP and low-k dielectrics, and demonstrated significant advantages in electrical properties over the traditional fluoride stripper. |
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Keywords: | Cu/low-k integration Wet-clean stripper CoWP compatibility CoWP/Cu galvanic corrosion Porous low-k compatibility |
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