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Micromechanical resonators with submicron capacitive gaps in 2 μm process
Authors:Shao  LC Palaniapan  M Khine  L Tan  WW
Affiliation:Nat. Univ. of Singapore, Singapore;
Abstract:An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2 mum commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35 MHz Lame-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64 mum, which boosted the resonance peak by 20 dB.
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