Micromechanical resonators with submicron capacitive gaps in 2 μm process |
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Authors: | Shao LC Palaniapan M Khine L Tan WW |
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Affiliation: | Nat. Univ. of Singapore, Singapore; |
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Abstract: | An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2 mum commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35 MHz Lame-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64 mum, which boosted the resonance peak by 20 dB. |
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