圆光栅玻璃的游离磨料研磨抛光加工工艺

用游离磨料对圆光栅玻璃表面进行了研磨抛光实验,讨论了磨粒尺寸、磨料质量分数、加工时间、研磨盘转速、加载压力、抛光垫材料对试件表面粗糙度和材料去除率的影响。研究表明,硬质抛光垫能更好地保持试件的平面度。获得的优化工艺参数组合为:研磨盘转速75r/min;磨料质量分数10%;研磨液流量10mL/min;5μm的Al2O3加载压力0.019MPa,粗研20min;1μm的Al2O3加载压力0.015MPa,精研20min;30nm的CeO2加载压力0.012MPa,精抛10min。在该工艺组合下,获得了表面粗糙度值Ra为3.3nm、平面度为5μm的圆光栅玻璃。

Lapping and polishing of circular grating glass with free abrasive

Free abrasive was used to lap and polish the circular grating glass,and the influence of process parameters,namely abrasive size,concentration of lapping liquid,processing time,plate speed,working pleasure,polishing pad material,on the surface quality and machining efficiency were discussed.Results showed that the hard polishing pad was better for the flatness of the glass.The optimized parameters are as follows：rotating speed 75 r/min,slurry concentration 10wt%,slurry flow 10 mL/min,5 μm Al2 O3 for rough lapping（20 min,0.019 MPa）,1 μm Al2 O3 for finishing（20 min,0.015 MPa）,30 nm CeO2 for polishing（10 min,0.012 MPa）.The surface roughness of the glass could reach R a 3.3 nm and the flatness reached 5 μm.