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多晶硅还原炉低电压启动转高电压启动设备结构改造
引用本文:黄琰,李国安. 多晶硅还原炉低电压启动转高电压启动设备结构改造[J]. 江西化工, 2011, 0(4): 183-184
作者姓名:黄琰  李国安
作者单位:江西赛维LDK太阳能多晶硅有限公司
摘    要:目前国内多晶硅生产中,还原炉多采用高电压击穿的方式启动,但国外多晶硅生产中多采用低电压击穿,一些进口还原炉采用了低电压启动的结构设计。现本文将以MSA还原炉为例,分析阐述满足低压启动还原炉改成高压启动条件,对炉体结构的改造方案。

关 键 词:多晶硅  还原炉  低压启动  高压启动  爬电距离

Polysilicon CVD Reactor Furnace Structure Reform from Low Voltage Startup to High Voltage Startup
Huang Yan Li Guo-an. Polysilicon CVD Reactor Furnace Structure Reform from Low Voltage Startup to High Voltage Startup[J]. Jiangxi Chemical Industry, 2011, 0(4): 183-184
Authors:Huang Yan Li Guo-an
Affiliation:Huang Yan Li Guo-an(Jiangxi LDK Solar Polysilicon Co.,LTD)
Abstract:The high voltage startup is used in our current domestic polysilicon CVD reactor production,but the polysilicon production abroad has adopted the low voltage startup,so,some imported CVD Reactor are designed with low voltage startup.This thesis will make the CVD Reactor manufactured by MSA Company for an example,and analyze and state how to reform the CVD Reactor furnace structure to make the low voltage startup transformed to high voltage startup.
Keywords:Polysilicon  CVD Reactor Low Voltage Startup High Voltage Startup Creepage Distance  
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