| KPFM导电探针的制备及应用 |
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| 引用本文： | 金晨,许军,王慧云,董诚,温焕飞,马宗敏. KPFM导电探针的制备及应用[J]. 国外电子测量技术, 2021, 40(2): 108-111 |
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| 作者姓名： | 金晨 许军 王慧云 董诚 温焕飞 马宗敏 |
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| 作者单位： | 中北大学电子测试技术国防科技重点实验室 太原030051 |
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| 基金项目： | 科技部国家重点研发计划(2018YFF01012502);国家自然科学基金(61874100);山西省重点研发计划(201803D421037);山西“1331工程”重点学科建设(1331KSC)项目资助。 |
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| 摘 要： | 开尔文探针力显微镜(KPFM)可以测量样品与探针之间的接触电势差(CPD),从而可以测得样品表面电势.为了更好地测量样品表面电势的微小变化,需要制备新型导电探针.金属铱稳定的化学性质与高导电率等特性能够稳定地测量尖端样品之间的电势差.实验使用物理气相沉积(PVD)的方法修饰硅探针,使针尖镀上一层厚度为纳米级的金属铱薄膜...
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| 关 键 词： | 开尔文探针力显微镜 超高真空 探针修饰 接触电势差 |
Fabrication and application of conducting probe for KPFM |
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| Jin Chen,Xu Jun,Wang Huiyun,Dong Cheng,Wen Huanfei,Ma Zongmin. Fabrication and application of conducting probe for KPFM[J]. Foreign Electronic Measurement Technology, 2021, 40(2): 108-111 |
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| Authors: | Jin Chen Xu Jun Wang Huiyun Dong Cheng Wen Huanfei Ma Zongmin |
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| Affiliation: | (Key Laboratory of Electronic Testing Technology for National Defense,North University of China,Taiyuan 030051,China) |
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| Abstract: | The Kelvin probe force microscope(KPFM)measures the contact potential difference(CPD)between the sample and the probe,allowing the surface potential of the sample to be measured.In order to better measure the small change of the surface potential of the sample,a new conducting probe is needed.The stable chemical properties and high conductivity of the metal iridium can steadily measure the potential difference between the tip samples.The silicon probe was modified by physical vapor deposition(PVD)and the tip was coated with a thin film of iridium.The probe was characterized by transmission electron microscopy(TEM)and energy spectrometer(EDS)before the experiment,and it was proved that the metal iridium film with nanometer thickness did exist on the tip.Finally,the prepared conductive probe was used to measure the silicon surface CPD in the ULTRA-high vacuum KPFM to obtain the surface step potential diagram of the sample. |
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| Keywords: | Kelvin probe force microscope ultra-high vacuum probe modification contact potential difference |
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