Depth profiling study on the migration of tritium in titanium induced by deuterium-ion bombardment |
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Authors: | Takao Yamamoto Shuichi Okuda and Masatoshi Fujishiro |
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Affiliation: | Radiation Center of Osaka Prefecture, Shinke-cho, Sakai, Osaka 593, Japan |
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Abstract: | A thin titanium layer with uniformly absorbed tritium (T/Ti ?1.0) was bombarded by 390 keV D3+ ions (130 keV per deuteron). Bombardment was performed at low (111 K) and room temperatures up to fluences of 5.9 × 1018 D/cm2 and 3.0 × 1018 D/cm2, respectively. Depth profiles of tritium up to a depth of 0.8 mg/cm2 (?1.8 μm) were measured and the change of the profile with fluence was investigated by means of the T(d, )n nuclear reaction. At both of the temperatures, a dip was formed on the depth profile of tritium at the depth around the projected range, indicating that the deuteron bombardment induced the migration of tritium against the concentration gradient. At the low temperature, the dip showed a gradual growth with fluence and saturation of the growth at the higher fluences, which could not be described by the existing model for isotope mixing. The spectrum of protons from the D(d, p)T reaction obtained in the same measurement suggested that the release of deuterium suddenly started at the final stage of the present bombardment. The dip formed at room temperature was larger than that at the low temperature. The migration of tritium induced by the bombardment is discussed on the basis of the experimental results obtained. |
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