The specific contact resistance of Pd2Si contacts on n- and p-Si
Authors:
A. Shepela
Affiliation:
Research and Development Center, Sprague Electric Company, North Adams, Massachusetts 02147, USA
Abstract:
The specific contact resistance ρc of Al and Pd2Si contacts has been measured on p- and n-Si substrates of uniform resistivity. The variation of ρc with substrate resistivity is described by the following equations: The specific contact resistance of Al contacts was found to be lower than the values of Pd2Si contacts on p-Si. Pd2Si contacts on both n- and p-Si, (111) orientation, become non-ohmic in the resistivity range .The data in this study are not sufficient to distinguish a variation in ρc with substrate orientation. Specific contact resistance values of Pd2Si contacts on and were not significantly different from values expected for the (111) substrates.