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The specific contact resistance of Pd2Si contacts on n- and p-Si
Authors:A. Shepela
Affiliation:Research and Development Center, Sprague Electric Company, North Adams, Massachusetts 02147, USA
Abstract:The specific contact resistance ρc of Al and Pd2Si contacts has been measured on p- and n-Si substrates of uniform resistivity. The variation of ρc with substrate resistivity is described by the following equations:
The specific contact resistance of Al contacts was found to be lower than the values of Pd2Si contacts on p-Si. Pd2Si contacts on both n- and p-Si, (111) orientation, become non-ohmic in the resistivity range 0.020?0.10 Ω-cm.The data in this study are not sufficient to distinguish a variation in ρc with substrate orientation. Specific contact resistance values of Pd2Si contacts on 0.005 Ω-cm (100) n-Si and 0.010 Ω-cm (100) p-Si were not significantly different from values expected for the (111) substrates.
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