玻璃和聚酰亚胺衬底上磁控溅射沉积的ZnO:Al透明导电膜的结构、电学和光学性能(英文)

利用射频磁控溅射方法在玻璃和聚酰亚胺膜(PI)衬底上沉积了氧化铝质量分数为2%的掺铝氧化锌透明导电薄膜(ZnO∶Al)。系统地研究了不同衬底材料对薄膜的结构、电学以及光学性能的影响。分析表明,衬底材料对薄膜的结晶性和电学性能有较大的影响,对可见光透射率却影响不大。X射线衍射(XRD)分析得出所有的ZnO∶Al具有良好的c轴择优取向性,在可见光区(400～800nm)两种衬底上的薄膜都达到了85%的透射率。玻璃衬底上的薄膜呈现出更强的(002)衍射峰及相对更小的半峰全宽(FWHM),薄膜电阻率达到了2.352×10-4Ω.cm。电镜分析表明,相对于PI上的ZnO∶Al膜,玻璃上ZnO∶Al膜表面有更致密的微观结构及更大的晶粒尺寸。PI衬底上的ZnO∶Al膜也有相对较好的电、光学性能,其中电阻率达到了6.336×10-4Ω.cm,而且由于PI衬底柔性可弯曲,使得它适于在柔性太阳电池和柔性液晶显示中做窗口层材料及透明导电电极。玻璃上的ZnO∶Al膜则可应用在平板显示和太阳电池技术中。

Structural,Electrical and Optical Properties of Aluminum-Doped Zinc Oxide Deposited on Glass and Polyimide by RF Magnetron Sputtering Method

The 2%(mass fraction of Al2O3) Al-doped ZnO(ZnO∶Al) thin films were sputtered on glass and polyimide(PI) substrates by radio-frequency(RF) magnetron sputtering technology.The effects of substrate materials on the structural,electrical and optical properties of ZnO∶Al thin films deposited on different substrates are studied.It is found that substrate materials have significant influence on film crystallization and resistivity but little on optical transmittance.Highly c-axis oriented ZnO∶Al films in(002) direction are observed on both glass and PI.Besides,it is manifested that the average optical transmittance in the visible-light range(400~800 nm) is around 85% for both films.Films on glass presents stronger(002) diffraction peaks and lower full-width at half maximum(FWHM).The lower resistivity of 2.352×10-4 Ω·cm is obtained in samples deposited on glass.Also,films on glass show larger grain size and denser microstructures than films on PI.Meanwhile,the ZnO∶Al films deposited on PI also own good crystallinity and low resistivity of 6.336×10-4 Ω·cm,which make them suitable as window materials in flexible solar cells.Films on glass are available as transparent electrodes in flat panel displays and solar cells.