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TaOx薄膜在VOx薄膜离子注入/抽出性能研究中的应用
引用本文:陈文锋,史月艳,张征. TaOx薄膜在VOx薄膜离子注入/抽出性能研究中的应用[J]. 真空科学与技术学报, 1999, 0(1)
作者姓名:陈文锋  史月艳  张征
作者单位:清华大学电子工程系!北京100084
摘    要:利用在可见光谱具有高透射比的TaOx离子导体薄膜作为保护层 ,研究了与水溶液发生化学反应的VOx薄膜的电化学性能及相应的可见光透射性能和色度变化。厚 10 0nm的TaOx薄膜即可达到对VOx薄膜的保护 ,避免水溶液对VOx薄膜的溶蚀 ,同时又不影响离子对VOx薄膜的注入 /抽出

关 键 词:离子注入/抽出  离子存储  离子导体  色度

TaO_x Films Used in Study of Ion Storage Layers of VO_x
Chen Wenfeng,Shi Yueyan,Zhang Zheng. TaO_x Films Used in Study of Ion Storage Layers of VO_x[J]. JOurnal of Vacuum Science and Technology, 1999, 0(1)
Authors:Chen Wenfeng  Shi Yueyan  Zhang Zheng
Abstract:VO x films used as ion storage materials is highly reactive with water.Effective protection can be obtained by growing thin TaO x layers with high luminous transmittance on top of the VO x films.The electro chemical properties,the possible variation in luminous transmittance and chroma of the TaO x protected VO x films,as well as the intercalation/extraction of Li were studied.Our results indicate that 100 nm thick TaO x layer may provide enough protection to the VO x films without any observable deterioration of the intercalation/extraction of Li .
Keywords:Ion intercalation/extraction  Ion storage  Ion conductor  Chroma
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