Features of surface structuring of silicon (100) crystals by microwave plasma treatment in different gas environments |
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| Authors: | V Ya Shanygin R K Yafarov |
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| Affiliation: | 1. Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch, Russian Academy of Sciences, Saratov, Russia
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| Abstract: | The laws of the effect of microwave plasma treatment modes on the surface nanomorphology of silicon single crystals with crystallographic orientation (100) with a natural oxide coating are studied. Model mechanisms of surface nanostructuring during plasma treatment in gas environments with different selectivities for the heterostructure material of the substrate are discussed. |
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