ELECTRON OPTICS OF VARIABLE RECTANGULAR SHAPED BEAM LITHOGRAPHY SYSTEM D J-2

The electron optical column for the variable rectangular-shaped beam lithographysystem DJ-2 is described,with emphasis on the analysis of the optical configuration and theshaping deflection compensation.In this column the variable spot shaping is performed with aminimum number of lenses by a more reasonable optical scheme.A high-sensitivity electrostaticshaping deflector with sequential parallel-plates is implemented for high-speed spot shaping.With a precise linear and rotational approach,the spot current density,the edge resolution aswell as the position of spot origin remain unchanged when the spot size varies.Experiments showthat the spot current density of over 0.4 A/cm~2 is obtained with a tungsten hairpin cathode,andthe edge resolution is better than 0.2μm within a 2×2 mm~2 field size.

Electron optics of variable rectangular shaped beam lithography system DJ-2

The electron optical column for the variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of the optical configuration and the shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with sequential parallel-plates is implemented for high- speed spot shaping. With a precise linear and rotational approach, the spot current density, the edge resolution as well as the position of spot origin remain unchanged when the spot size varies. Experiments show that the spot current density of over 0.4 A/cm² is obtained with a tungsten hairpin cathode, and the edge resolution is better than 0.2 μm within a 2×2 mm² field size.