| 铜电极上席夫碱自组装膜的电化学阻抗表征 |
| |
| 引用本文： | 全贞兰,吴培强. 铜电极上席夫碱自组装膜的电化学阻抗表征[J]. 青岛科技大学学报(自然科学版), 2006, 27(4): 291-294 |
| |
| 作者姓名： | 全贞兰 吴培强 |
| |
| 作者单位： | 青岛科技大学,化学与分子工程学院,山东,青岛,266042;加拿大西安大略大学,化学系,加拿大,安大略,N6A 5B7 |
| |
| 摘 要： | 用电化学阻抗法表征了铜表面上席夫碱自组装膜及其硫醇改进膜。研究结果表明,因席夫碱分子的刚性结构,使自组装膜中含有部分缺陷。用烷基硫醇进一步修饰席夫碱自组装膜后,表面覆盖度明显增加,而膜电容显著降低,说明膜质量得到了改善。
|
| 关 键 词： | 席夫碱 自组装膜 电化学阻抗 |
| 文章编号： | 1672-6987(2006)04-0291-04 |
| 修稿时间： | 2006-01-06 |
EIS Characterization of Self-assembled Monolayers of Schiff Bases on Cu Surface |
| |
| QUAN Zhen-lan,WU Pei-qiang. EIS Characterization of Self-assembled Monolayers of Schiff Bases on Cu Surface[J]. Journal of Qingdao University of Science and Technology:Natutral Science Edition, 2006, 27(4): 291-294 |
| |
| Authors: | QUAN Zhen-lan WU Pei-qiang |
| |
| Abstract: | Self-assembled monolayers(SAMs) of Schiff bases were prepared on copper surface and characterized by electrochemical impedance spectroscopy (EIS).The results showed that the SAMs of pure Schiff bases possessed some unfilled defect sites due to their rigid structure.A higher surface coverage and a lower film capacitance were obtained with a subsequent modification with alkanethiol,indicating a significant improvement in the quality of the films. |
| |
| Keywords: | Schiff bases self-assembled monolayers electrochemical impedance spectroscopy |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
