Scaling merged single-device-well MOSFETs for very large scale integration

Single-Device-Well (SDW) MOSFETs are high density MOSFET structures based on merging two MOSFET devices; a surface channel device and a buried channel device sharing the same device well and the same gate. SDWs offer a potential device area saving of 50%. The merits of the merged SDW MOSFETs are further enhanced in a scaled down MOSFET VLSI technology. This is the subject of this paper.