A new MNOS memory element—the tunnel diode

MNOS (Metal-Nitride-Oxide-Silicon) memory devices commercially available today consist of transistor arrays where each device represents a memory bit. Typical devices have densities greater than 8 K bits and are generally manufactured on epitaxial based processes for isolation. The state of each bit is determined by its threshold voltage and is sensed by interpreting if the transistor is in the “off” or “on” condition. A new MNOS memory element is described where detection of junction tunnelling current is used as the sense mechanism. Substrate forms the “third” terminal and the element has the possibility of being the basis of a dense array. The technique can be developed in p or n channel and can be used as an add-on to volatile random access memories.