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Ellipsometrische Charakterisierung von C‐Schutzschichten für die Speichertechnologie
Authors:Ralph Ohr Dipl.‐Phys.  Marc Neuhüuser Dipl.‐Phys.  Heinz Hilgers Dr.  Peter Pokrowsky Prof. Dr.  Gerd Schönhense Prof. Dr.  Georg Dittmar Dr.
Affiliation:1. IBM Mainz, Abteilung 4627, Hechtsheimerstr. 2, 55131 Mainz;2. SENTECH Instruments GmbH, Carl‐Scheele‐Straße 16, 12489 Berlin
Abstract:Spectroscopic Ellipsometry is a fast, non‐destructive and reliable method for characterizing thin films, based on interaction between incident light and a multilayer system. For our investigations, light in the visible spectral range has been used to characterize protective carbon coatings with thicknesses of 2‐7nm on magnetic hard disks. The specific disk layer stack has been described with an adequate one‐layer model. With regard to an accurate analysis of the covering carbon coating a reproducible procedure for determining the underlying metallic material has been developed. The measured ellipsometric parameters (ψ, Δ) display a linear dependence on carbon film thickness which shows an appropriate application of the used model down to a thickness of 2 nm. By means of simulation calculations, criteria for the selection of optimized wavelengths with respect to film characterization has been established. Furthermore, an increasing extinction coefficient κ with rising nitrogen content in the carbon coating could be stated. Apparent time instabilities in the determination of layer thickness d and extinction coefficient κ of the carbon film could be explained as due to adsorption processes on the surface.
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