Fault isolation at P/N junction by nanoprober |
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| Affiliation: | 1. Science and Technology on Integrated Logistics Support Laboratory, National University of Defense Technology, Changsha, China;2. Mianyang High-tech Experimental Middle School, Mianyang, China;1. Department of Electrical and Electronic Engineering, University of Cagliari, Cagliari, Italy;2. Intraspec Technologies, 3 avenue Didier Daurat, 31400 Toulouse, France;3. CNES, 18 avenue Edouard Belin, 31401 Toulouse Cedex 9, France;1. Fraunhofer Institute for Microstructure of Materials and Systems IMWS, Halle, Germany;2. X-FAB Semiconductor Foundries AG, Erfurt, Germany |
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| Abstract: | Precise location of leakage in a P-well/N-well junction has been identified by an AFM (atomic force microscope)-based nanoprober. In order to provide the accurate position of the failure for further analysis, a new method was proposed by combining nanoprobing I–V results on each P-well/N-well contact together with semi-empirical calculation to identify the possible leakage path. Further plan view TEM analysis confirms our result. |
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