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Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
Affiliation:1. Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, China;2. HGST-A Western Digital Company, 3403 Yerba Buena Road, San Jose, CA 95135, USA;3. IBM Albany NanoTech, 257 Fuller Road, Albany, NY 12203, USA;4. Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, IL 60637, USA;1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA;2. Institute for Soldier Nanotechnologies, Massachusetts Institute of Technology, Cambridge, MA 02139, USA;3. Department of Mechanical Engineering and Materials Science, Rice University, Houston, TX 77005, USA;1. Microsystems Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland;2. IBM Research – Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;1. Department of Physics, Imperial College London, London SW7 2AZ, UK;2. School of Physical Sciences (Chemistry), University of Tasmania, Hobart, TAS 7005, Australia;3. School of Chemistry and the Australian Institute for Nanoscale Science and Technology, The University of Sydney, NSW 2006, Australia;1. imec vzw, Kapeldreef 75, 3001 Leuven, Belgium;2. Tokyo Electron Miyagi Limited, 1 Techno-Hills, Taiwa-cho, Kurokawa-gun, Miyagi 981-3269, Japan;3. Tokyo Electron Europe Limited, Kerkenbos 10-15 Unit C, 6546 BB Nijmegen, The Netherlands;4. Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Jones 217, Chicago, IL 60637, USA;5. Katholieke Universiteit Leuven (K.U. Leuven), Department of Electrical Engineering (ESAT), Kasteelpark Arenberg 10, B-3001 Heverlee, Belgium
Abstract:Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines advantages of conventional photolithography and polymeric materials and shows promise for meeting a sufficiently inclusive set of manufacturing constraints for applications in semiconductors and data storage. DSA attracts attention from both academia and industry and tremendous progress has been achieved in the past decade. This review highlights the development of DSA with an emphasis on efforts toward the integration of block copolymer lithography into the current lithographic process for the fabrication of devices for integrated circuits and bit-patterned media.
Keywords:Directed self-assembly  Chemical pattern  Block copolymer lithography  Nanofabrication  Pattern transfer  Bit-patterned media
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