Double aberration correction in a low-energy electron microscope |
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| Authors: | Th. Schmidt,H. Marchetto,P.L. Lé vesque,U. Groh,F. Maier,D. Preikszas,P. Hartel,R. Spehr,G. Lilienkamp,W. Engel,R. Fink,E. Bauer,H. Rose,E. Umbach,H.-J. Freund |
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| Affiliation: | 1. Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 6-8, D-14195 Berlin, Germany;2. Universität Würzburg, Experimentelle Physik II, Am Hubland, D-97074 Würzburg, Germany;3. Technische Universität Darmstadt, Angewandte Physik, Hochschulstraße 6, D-64289 Darmstadt, Germany;4. Universität Erlangen-Nürnberg, Physikalische Chemie II, Egerlandstraße 3, D-91058 Erlangen, Germany;5. Technische Universität Clausthal, Physikalisches Institut, Leibnizstraße 4, D-38678, Germany;6. Carl Zeiss NTS GmbH, Carl-Zeiss-Straße 56, D-73447 Oberkochen, Germany;g Arizona State University, Department of Physics, Tempe, AZ 85287, USA |
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| Abstract: | The lateral resolution of a surface sensitive low-energy electron microscope (LEEM) has been improved below 4 nm for the first time. This breakthrough has only been possible by simultaneously correcting the unavoidable spherical and chromatic aberrations of the lens system. We present an experimental criterion to quantify the aberration correction and to optimize the electron optical system. The obtained lateral resolution of 2.6 nm in LEEM enables the first surface sensitive, electron microscopic observation of the herringbone reconstruction on the Au(1 1 1) surface. |
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| Keywords: | Aberration correction Low-energy electron microscopy High resolution electron microscopy |
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