Phase-selective staining of metal salt for scanning electron microscopy imaging of block copolymer film |
| |
| Authors: | Jing Ze Li Ying Wang Zhi Hong Wang Di Mei Wei Zou Ai Min Chang Qi Wang Motonori Komura Kaori Ito Tomokazu Iyoda |
| |
| Affiliation: | 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronic and Solid-state Electronic, University of Electronic Science and Technology of China, Chengdu 610054, China;2. State Key Laboratory of Polymer Materials Engineering (Sichuan University), Chengdu 610054, China;3. Xinjiang Key Laboratory of Electronic Information Materials and Devices, Urumuqi 830011, China;4. Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan |
| |
| Abstract: | Three metal salts, i.e., AgNO3, HAuCl4, and KCl, were proposed as novel staining reagents instead of traditional RuO4 and OsO4 labeled with expensive price and extreme toxicity for scanning electron microscopy (SEM) imaging of microphase separated block copolymer film. A simple and costless aqueous solution immersion procedure could ensure selective staining of the metal slat in specific phase of the nanostructured copolymer film, leading to a clear phase contrasted SEM image. The heavy metal salt has better staining effect, demonstrating stable and high signal-to-noise SEM image even at an acceleration voltage as high as 30 kV and magnification up to 250,000 times. |
| |
| Keywords: | Scanning electron microscopy Block copolymer Metal salt Staining reagent Phase-selective |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
