| 纳米压印技术的工艺和图形精度研究 |
| |
| 引用本文： | 司卫华,董晓文,顾文琪. 纳米压印技术的工艺和图形精度研究[J]. 半导体光电, 2006, 27(4): 441-444 |
| |
| 作者姓名： | 司卫华 董晓文 顾文琪 |
| |
| 作者单位： | 中国科学院电工研究所,北京,100080;中国科学院研究生院,北京,100039;中国科学院电工研究所,北京,100080 |
| |
| 摘 要： | 纳米压印技术通过压印实现了纳米结构的图形转移，具有分辨率高、效率高、成本低的优点。通过对纳米压印过程中影响图形精度的一些因素进行分析，提出了相应的解决方法。结合研制的NIL-01型压印机进行工艺实验，给出纳米压印工艺实验的结果，并对结果进行了分析。试验表明：考虑到影响压印图形精度的各种因素，采用镀有Cr的SiO2模版和NIL-01型压印机，用热压印技术可以压印出具有100nm特征尺寸的PMMA图形。
|
| 关 键 词： | 纳米压印 压印图形 图形精度 模版 |
| 文章编号： | 1001-5868(2006)04-0441-04 |
| 收稿时间： | 2005-10-24 |
| 修稿时间： | 2005-10-24 |
Process and Pattern Precision in Nano-imprinting Lithography |
| |
| SI Wei-hua,DONG Xiao-wen,GU Wen-qi. Process and Pattern Precision in Nano-imprinting Lithography[J]. Semiconductor Optoelectronics, 2006, 27(4): 441-444 |
| |
| Authors: | SI Wei-hua DONG Xiao-wen GU Wen-qi |
| |
| Affiliation: | 1. Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100080, CHN ; 2. Graduate School of Chinese Academy of Sciences,Beijing 100039,CHN |
| |
| Abstract: | By pressing, nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution, high efficiency and low cost. By analyzing some factors influencing the pattern precision in nano-imprinting, corresponding measures have been proposed. Experiment has been carried out using self-made NIL-01 nano-imprinting equipment. Experimental results show that, in considering a variety of factors influencing pattern precision, PMMA pattern with feature size of 100 nm can be got in hot embossing through SlOe mask coated with Cr and NIL-01 nano-imprint equipment. |
| |
| Keywords: | nano-imprinting pattern pattern precision mask |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
