| Development of a Hybrid Photopolymer for Stereolithography |
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| 引用本文： | GAN Zhiwei MO Jianhua HUANG Shuhuai Hongquan. Development of a Hybrid Photopolymer for Stereolithography[J]. 武汉理工大学学报(材料科学英文版), 2006, 21(1): 99-101. DOI: 10.1007/BF02861482 |
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| 作者姓名： | GAN Zhiwei MO Jianhua HUANG Shuhuai Hongquan |
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| 作者单位： | [1]State Key Lab of Plastic Forming Simulation and Die ＆ Mould Technology,Wuhan 430074,China [2]Department of Chemistry, Huazhong University of Science and Technology, Wuhan 430074,China |
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| 摘 要： | 1 IntroductionRapid Prototyping (RP) was developed as a newmanufacture technique and considered a significant break-through in the field of manufacturing in the past 20years[1-4].The principle of RPis based on layer additivefabrication. Firstly, a three-dimensional object modelfromcomputer-aided design (CAD) is divided into manythinlayers by delaminatingsoftware .Thetwo-dimensionaldata of eachthinlayer control alaser beam,whichirradi-ates many materials like resin point-by-point ,and solid…
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| 收稿时间： | 2004-02-24 |
| 修稿时间： | 2005-10-23 |
Development of a hybrid photopolymer for stereolithography |
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| Gan Zhiwei Ph D candidate,Mo Jianhua,Huang Shuhuai,Xie Hongquan. Development of a hybrid photopolymer for stereolithography[J]. Journal of Wuhan University of Technology. Materials Science Edition, 2006, 21(1): 99-101. DOI: 10.1007/BF02861482 |
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| Authors: | Gan Zhiwei Ph D candidate Mo Jianhua Huang Shuhuai Xie Hongquan |
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| Affiliation: | (1) State Key Lab of Plastic Forming Simulation and Die & Mould Technology, 430074 Wuhan, China;(2) Department of Chemistry, Huazhong University of Science and Technology, 430074 Wuhan, China |
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| Abstract: | New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA- I from this hybrid resin successfully and efficiently. |
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| Keywords: | stereolithography UV-curing resin free radical-cationic hybrid photopolymer stereolithography parts |
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