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超薄硅纳米谐振梁的制作及谐振特性的测量
引用本文:夏晓媛,李昕欣,王跃林,李铁,杨衡,焦继伟. 超薄硅纳米谐振梁的制作及谐振特性的测量[J]. 纳米技术与精密工程, 2008, 6(1): 1-4
作者姓名:夏晓媛  李昕欣  王跃林  李铁  杨衡  焦继伟
作者单位:中国科学院上海微系统与信息技术研究所,上海,200050
基金项目:国家重点基础研究发展计划(973计划)
摘    要:利用氧化、光刻、刻蚀、溅射等传统MEMS加工工艺,在绝缘衬底上的硅(SOI)基片上制作出一种厚度只有50nm的双端固支结构的硅纳米谐振梁;在实验室条件下,针对实验中谐振梁的结构特点,提出了静电激励与感生电动势检测(EMF)的测量方法,并利用专业的Conventorware MEMS仿真软件及ANSYS有限元分析软件,定量地给出合适的静电驱动电压,同时初步估算了梁谐振时将会产生的感生电动势的大小,并对此分析结果提出了相应的测试电路,为下一步对这种超薄纳米梁的实际测试工作提供了可行性的理论参考.

关 键 词:双端固支硅纳米梁  感生电动势检测  谐振特性  静电驱动
文章编号:1672-6030(2008)01-0001-04
收稿时间:2007-08-12
修稿时间:2007-08-12

Fabrication and Detection of Ultrathin Silicon Nano-Beam Resonator
XIA Xiao-yuan,LI Xin-xin,WANG Yue-lin,LI Tie,YANG Heng,JIAO Ji-wei. Fabrication and Detection of Ultrathin Silicon Nano-Beam Resonator[J]. Nanotechnology and Precision Engineering, 2008, 6(1): 1-4
Authors:XIA Xiao-yuan  LI Xin-xin  WANG Yue-lin  LI Tie  YANG Heng  JIAO Ji-wei
Affiliation:(Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Abstract:A double-clamped silicon nano-beam with a thickness of 50 nm on silicon-on-insulator(SOI) substrate was fabricated by using oxidation, photolithography, etching, sputtering and other MEMS processing technology. The method of electrostatic actuation and induced electromotive force (EMF) detection were put forward according to the structural feature of the nano-beam. The proper actuated-voltage and induced EMF were estimated with the simulation softwares ANSYS and Conventorware, and based on above, the interface detection circuit was designed. The results mentioned above provide feasible theoretical reference for the further practical detection on the resonant response of ultrathin nano-beam.
Keywords:double-clamped silicon nano-beam   induced EMF detection   resonant response   electrostatic actuation
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