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A Gate‐Current Model for Advanced MOSFET Technologies Implemented into HiSIM2
Authors:Ryosuke Inagaki  Norio Sadachika  Dondee Navarro  Mitiko Miura‐Mattausch  Yasuaki Inoue
Abstract:A gate leakage current model for advanced MOSFETs has been developed and implemented into the Hiroshima‐university STARC IGFET Model (HiSIM), the first complete surface‐potential‐based model. The model consists of four tunneling mechanisms, the gate to channel/bulk/source/drain, and requires totally 15 model parameters covering all bias conditions. Simulation results reproduce measurement for any device size and temperature without binning. Validity of the model has been tested with circuits that are sensitive to the change of stored charge due to tunneling current. Copyright © 2007 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.
Keywords:HiSIM  gate current  leakage current  tunneling current  surface potential  without binning
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