| 掺氮二氧化钛薄膜的常压化学气相沉积及其结构性能研究 |
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| 引用本文： | 郭玉,张溪文,韩高荣.掺氮二氧化钛薄膜的常压化学气相沉积及其结构性能研究[J].真空科学与技术学报,2006,26(3):190-194. |
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| 作者姓名： | 郭玉 张溪文 韩高荣 |
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| 作者单位： | 硅材料国家重点实验室浙江大学,杭州,310027 |
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| 基金项目： | 国家高技术研究发展计划(863计划);国家高技术研究发展计划(863计划) |
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| 摘 要： | 用常压化学气相沉积（APCVD）法，以四氯化钛（TiCl4）、氧气（O2）和氨气（NH3）作为气相反应先驱体，成功制备了掺氮二氧化钛（TiO2）薄膜。XRD、XPS和UV—Vis透射光谱研究表明，氮掺杂在二氧化钛薄膜中引入Ti4O7相，抑制了锐钛矿相向金红石相的转变；氮掺杂促使光吸收限红移，提高了薄膜在可见光照射下的光催化效率，并改善了薄膜表面的亲水性能。该工艺成本低廉，成膜速度快（150nm／min），适用于工业化浮法玻璃生产线，产业化前景广阔。
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| 关 键 词： | 常压化学气相沉积 掺氮TiO2薄膜 光催化性 亲水性 |
| 文章编号： | 1672-7126（2006）03-0190-05 |
| 收稿时间： | 2005-05-16 |
| 修稿时间： | 2005年5月16日 |
Microstructures and Properties of N-Doped TiO2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition |
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| Guo Yu,Zhang Xiwen,Han Gaorong.Microstructures and Properties of N-Doped TiO2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition[J].JOurnal of Vacuum Science and Technology,2006,26(3):190-194. |
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| Authors: | Guo Yu Zhang Xiwen Han Gaorong |
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| Affiliation: | Department of Materials Science and Engineering, Silicon State Key lab. Zhejiang University, Hangzhou ,310027, China |
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| Abstract: | N-doped TiO_2 films were grown by atmospheric pressure chemical vapor deposition(APCVD) with TiCl_4 and NH_3 as precursors.The films were characterized with X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS) and ultraviolet visible light spectroscopy(UV-Vis).The results show that nitrogen doping results in formation of Ti_4O_7 phase and holds back anatase-rutile phase transformation and that the N-doped TiO_2 film has narrower band-gap,resulting in red-shift of light absorption,higher photo-catalysis and hydrophilicity.The advantages of the N-doped TiO_2 films growth include low cost,high deposition rate and compatibility to industrial float glass production. |
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| Keywords: | APCVD N doped titanium dioxide film Photocatalysis Hydrophilicity |
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