| NiCr溅射薄膜内应力的研究 |
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| 引用本文： | 于映,陈跃. NiCr溅射薄膜内应力的研究[J]. 真空电子技术, 2000, 0(5): 9-12 |
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| 作者姓名： | 于映 陈跃 |
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| 作者单位： | 福州大学电子科学与应用物理系!福建福州350002 |
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| 基金项目： | 福建省自然科学基金资助项目 |
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| 摘 要： | 本文采用磁控溅射法在０．５ｍｍ厚的４０Ｃｒ钢基片上沉积１￣１２μｍ的ＮｉＣｒ合金薄膜，运用钠光平面干涉法测量ＮｉＣｒ溅射薄膜的内应在力，研究表明影响ＮｉＣｒ薄膜内应力的主要因素是工作气压和基片温度，并运用Ｋｌｏｋｏｌｍ理论对该影响作用进行了分析。
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| 关 键 词： | NiCr薄膜 内应力 磁控溅射 |
Study on Internal Stresses of Sputtered Nickel Chromium Thin Films |
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| YU Ying,CHEN Yue. Study on Internal Stresses of Sputtered Nickel Chromium Thin Films[J]. Vacuum Electronics, 2000, 0(5): 9-12 |
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| Authors: | YU Ying CHEN Yue |
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| Abstract: | The Nickel Chromium alloy thin films were prepared on 40 Cr steel substrate by magnetron sputtering method.The elastic deformation of NiCr fimls were measured by using laser beam planar interference.It was shown that the main factors which affected the internal stesses of NiCr thin films were substrate temperature and sputtering pressure.The influences on internal stresses were analyzed using Klokholm theory. |
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| Keywords: | NiCr thin films Internal stresses magnetron sputtering |
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