| 光学光刻技术现状及发展趋势 |
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| 引用本文： | 童志义.光学光刻技术现状及发展趋势[J].电子工业专用设备,2001,30(1):1-9. |
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| 作者姓名： | 童志义 |
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| 作者单位： | 信息产业部电子第四十五研究所, |
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| 摘 要： | 综述了光学光刻目前的主流技术— 2 48nm曝光技术现状 ,介绍了折射式透镜和反射折射式透镜结构及性能。结合 1 93nm技术的开发 ,比较了 2种结构的优势。最后给出了光刻设备的市场概况并讨论了光学光刻技术的发展趋势。
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| 关 键 词： | 光学光刻 248nm曝光 193nm曝光 折射系统 反射折射系统 设备市场 |
| 文章编号： | 1004-4507(2001)01-0001-09 |
| 修稿时间： | 2000年11月25 |
The Present Situation of Optical Lithography and Its Future |
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| TONG Zhi-yi.The Present Situation of Optical Lithography and Its Future[J].Equipment for Electronic Products Marufacturing,2001,30(1):1-9. |
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| Authors: | TONG Zhi-yi |
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| Abstract: | The present situation of the major technology in optical lithography is described,which is 248nm exposure technology.The construction and performance of refractive lens and catadioptric lens is also introduced.On the basis of the development of 193nm technology,the advantage of both constructions is compared.The market survey for optical exposure tools in recent years is shown and discusses the future for optical lithography technology. |
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| Keywords: | Optical Lithography 248nm Exposure 193nm Exposure Refractive Lens Catadioptric Lens Equipment Market Prospect |
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