介质膜光栅槽形无损检测方法的研究

为了从理论上探究介质膜基底光刻胶光栅掩模槽形的检测方法,对此种光栅掩模建立了以C方法为理论基础的衍射效率理论计算的数学模型,并将从实际光栅掩模的SEM照片得出的光栅槽形参数带入到该模型中,得到了一系列-1级衍射光的光谱分布曲线,这些曲线的变化趋势与一定光栅槽形相对应,提出了通过测量衍射光的光谱分布曲线判断光栅槽形的无损检测方法。分析表明,该方法在光栅槽形的检测过程中,可以较为有效地判断光刻胶是否到底,而这一点在掩模的制作工艺中至关重要。

Nondestructive testing method for dielectric reflection grating

The efficiency of dielectric reflection grating was calculated with C method theoretically.Characteristics of the photoresist grating mask were obtained from SEM pictures and the curves of grating efficiency were presented.The trend of these curves had some relationships with correspondent masks' characteristics.So,a nondestructive testing method with the characteristic spectrum of efficiency to estimate the groove of grating was put forward.It is concluded that this method is useful to determine whether the photoresist has been developed to the basement which is the key in manufacture technology of grating mask.