Threshold behavior of the formation of nanometer islands in a Ge/Si(100) system in the presence of Sb

Atomic-force microscopy is used to study the behavior of an array of Ge islands formed by molecular-beam epitaxy on an Si (100) surface in the presence of an antimony flux incident on the surface. It is shown that, as the Sb flux increases to a certain critical level, the surface density of the islands increases; however, if this critical level is exceeded, nucleation of the islands is suppressed and mesoscopic small-height clusters are observed on the surface. This effect is explained qualitatively in the context of a kinetic model of the islands’ formation in heteroepitaxial systems mismatched with respect to their lattice parameters.