Investigation of structural properties of ITO thin films deposited on different substrates |
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| Authors: | M Purica F Iacomi N Apetroaei D Luca |
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| Affiliation: | a National R&D Institute for Microtechnologies, P.O. Box 38-160, 72225, Bucharest, Romania
b Faculty of Physics, Alexandru Ioan Cuza University Ia?i, 11 Carol I Blvd. 700506-Ia?i, Romania |
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| Abstract: | The influence of the substrate nature on the structure and morphology of ITO thin films grown by thermal evaporation in vacuum is investigated. The as-prepared metal films with Sn/In molar ratio of 0.1 were subsequently annealed for 2 h at 723 K in air (to obtain tin doped indium oxide), then annealed in vacuum at 523 K, followed by UV irradiation (to reduce the electrical resistivity). Irrespective of substrate nature, XRD data evidence a (222) preferential orientation in films. Substrate nature, annealing in vacuum and UV irradiation influence the structure, morphology, optical, electrical and surface wetting properties of the films' surface. |
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| Keywords: | ITO Thermal deposition Structure Optical properties Surface wetting |
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