Fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam method |
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| Authors: | Xingsheng Xu Hongda Chen Aizi Jin Bingying Cheng |
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| Affiliation: | a State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083, China
b Institute of Physics, Chinese Academy of Sciences, Beijing 100083, China |
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| Abstract: | In this paper, we introduced the fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam machine, it shows that the method of focused-ion beam can fabricate two-dimensional photonic crystal and photonic crystal device efficiently, and the quality of the fabricated photonic crystal is high. Using the focused-ion beam method, we fabricate photonic crystal wavelength division multiplexer, and its characteristics are analyzed. |
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| Keywords: | Photonic crystal Semiconductor Focused-ion beam |
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