Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering |
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| Authors: | Sukhvinder Singh S.S. Major |
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| Affiliation: | a Department of Physics, Indian Institute of Technology Bombay, Mumbai-400076, India
b Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Mumbai-400076, India |
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| Abstract: | Zinc Oxide films were deposited on quartz substrates by reactive rf magnetron sputtering of zinc target. The effect of substrate temperature on the crystallinity and band edge luminescence has been studied. The films deposited at 300 °C exhibited the strongest c-axis orientation. AFM and Raman studies indicated that the films deposited at 600 °C possess better overall crystallinity with reduction of optically active defects, leading to strong and narrow PL emission. |
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| Keywords: | ZnO rf magnetron sputtering Microstructure Optical properties |
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