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衬底温度对Sn掺杂ZnO薄膜结构、电学和光学性能的影响
引用本文:谌夏,方亮,吴芳,阮海波,魏文猴,黄秋柳. 衬底温度对Sn掺杂ZnO薄膜结构、电学和光学性能的影响[J]. 材料导报, 2012, 26(10): 33-35,57
作者姓名:谌夏  方亮  吴芳  阮海波  魏文猴  黄秋柳
作者单位:1. 重庆理工大学材料学院,重庆,401331
2. 重庆大学物理学院,重庆,400044
基金项目:国家自然科学基金(NCFC11074314;50942001);重庆大学研究生创新基金(CDJXS10102207);重庆大学“211工程”三期创新人才培养计划建设项目S-09109;重庆大学大型仪器设备开放基金(2010063072;2010121556)
摘    要:采用射频磁控溅射技术在石英衬底上制备了掺杂浓度为0.5%(原子分数)的ZnO∶Sn(TZO)薄膜,研究了不同衬底温度下薄膜的结构、形貌、电学和光学的性能.研究发现,TZO薄膜沿着C轴择优生长,在400℃时结晶度最好,最低电阻率为2.619×10-2Ω·cm,在可见光范围内具有较好的透光率.

关 键 词:Sn掺杂ZnO薄膜  射频磁控溅射  光学性质  电学性质

Effect of Substrate Temperature on the Structure, Electrical and Optical Properties of Sn-doped ZnO Thin Films
CHEN Xia , FANG Liang , WU Fang , RUAN Haibo , WEI Wenhou , HUANG Qiuliu. Effect of Substrate Temperature on the Structure, Electrical and Optical Properties of Sn-doped ZnO Thin Films[J]. Materials Review, 2012, 26(10): 33-35,57
Authors:CHEN Xia    FANG Liang    WU Fang    RUAN Haibo    WEI Wenhou    HUANG Qiuliu
Affiliation:1 College of Materials Science and Engineering,Chongqing University of Technology,Chongqing 401331; 2 College of Physics,Chongqing University,Chongqing 400044)
Abstract:Tin doped zinc oxide(TZO) thin films were prepared by radio frequency magnetron sputtering on quartz glass substrates.The concentration of Sn element in the powder target was 0.5% in atomic ratio.The effect of substrate temperature on the structural,surface morphologies,electrical and optical properties of the ZnO∶Sn thin films was investigated.It was found that the as-deposited film is C-axis perpendicular to the substrate.The lowest resistivity(2.619×10-2Ω·cm),and the best crystal quality were obtained at 400℃.In the visible region,the films were with good transmittance.
Keywords:tin doped zinc oxide  radio frequency magnetron sputtering  optical properties  electrical properties
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