| AZO薄膜制备工艺及其性能研究 |
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| 引用本文： | 黄稳,余洲,张勇,刘连,黄涛,闫勇,赵勇. AZO薄膜制备工艺及其性能研究[J]. 材料导报, 2012, 26(1): 35-39 |
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| 作者姓名： | 黄稳 余洲 张勇 刘连 黄涛 闫勇 赵勇 |
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| 作者单位： | 1. 西南交通大学超导研究开发中心材料先进技术教育部重点实验室,成都,610031
2. 西南交通大学超导研究开发中心材料先进技术教育部重点实验室,成都610031;新南威尔士大学材料科学与工程学院,悉尼2052 |
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| 基金项目： | 中央高校基本科研业务费专项资金，国际自然科学基金，国家高科技项目，高等学校博士点专项科研基金，长江学者与创新团队计划 |
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| 摘 要： | 综述了掺铝氧化锌(AZO)薄膜制备方法与光电特性,重点阐述了磁控溅射法制备工艺参数如衬底温度、溅射功率、气体压强、溅射时间、衬底和靶间距、负偏压等对AZO薄膜结构、光电性能的影响,并指出目前AZO薄膜的研究关键以及所面临的挑战,展望了未来的研究方向。
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| 关 键 词： | AZO 结构特性 光电特性 |
Research on Preparation Technology and Properties of AZO Thin Films |
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| HUANG Wen , YU Zhou , ZHANG Yong , LIU Lian , HUANG Tao , YAN Yong , ZHAO Yong. Research on Preparation Technology and Properties of AZO Thin Films[J]. Materials Review, 2012, 26(1): 35-39 |
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| Authors: | HUANG Wen YU Zhou ZHANG Yong LIU Lian HUANG Tao YAN Yong ZHAO Yong |
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| Affiliation: | 1,2 (1 Superconductivity R&D Center(SRDC),Key Laboratory of Advanced Technology of Materials of Ministry of Education,Southwest Jiaotong University,Chengdu 610031;2 School of Materials Science and Engineering, University of New South Wales,Sydney 2052) |
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| Abstract: | The preparation technology and opto-electrical properties of AZO thin films are reviewed.The in-fluences of magnetron sputtering parameters such as substrate temperature,sputtering power,gas pressure,sputtering time,distance between substrate and target,negative bias and so on on the structural and opto-electrical properties of AZO thin films are summarized.Moreover,the key problems and the challenges of the present researches are discussed and the possible future developments are given. |
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| Keywords: | AZO structural properties opto-electrical properties |
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