首页 | 本学科首页   官方微博 | 高级检索  
     


Electrochemical destruction of chlorophenoxy herbicides by anodic oxidation and electro-Fenton using a boron-doped diamond electrode
Authors:Enric Brillas  Birame Boye  José Antonio Garrido  Conchita Arias  Christos Comninellis
Abstract:The degradation of herbicides 4-chlorophenoxyacetic acid (4-CPA), 4-chloro-2-methylphenoxyacetic acid (MCPA), 2,4-dichlorophenoxyacetic acid (2,4-D) and 2,4,5-trichlorophenoxyacetic acid (2,4,5-T) in aqueous medium of pH 3.0 has been comparatively studied by anodic oxidation and electro-Fenton using a boron-doped diamond (BDD) anode. All solutions are totally mineralized by electro-Fenton, even at low current, being the process more efficient with 1 mM Fe2+ as catalyst. This is due to the production of large amounts of oxidant hydroxyl radical (OHradical dot) on the BDD surface by water oxidation and from Fenton’s reaction between added Fe2+ and H2O2 electrogenerated at the O2-diffusion cathode. The herbicide solutions are also completely depolluted by anodic oxidation. Although a quicker degradation is found at the first stages of electro-Fenton, similar times are required for achieving overall mineralization in both methods. The decay kinetics of all herbicides always follows a pseudo first-order reaction. Reversed-phase chromatography allows detecting 4-chlorophenol, 4-chloro-o-cresol, 2,4-dichlorophenol and 2,4,5-trichlorophenol as primary aromatic intermediates of 4-CPA, MCPA, 2,4-D and 2,4,5-T, respectively. Dechlorination of these products gives Cl, which is slowly oxidized on BDD. Ion-exclusion chromatography reveals the presence of persistent oxalic acid in electro-Fenton by formation of Fe3+-oxalato complexes, which are slowly destroyed by OHradical dot adsorbed on BDD. In anodic oxidation, oxalic acid is mineralized practically at the same rate as generated.
Keywords:Chlorophenoxy herbicides  Anodic oxidation  Electro-Fenton  Boron-doped diamond anode  Water treatment
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号