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电场增强的阴极弧放电TiCN薄膜结构及性能研究
引用本文:孔营,马英鹤,李永健,胡健,高峻峰,巩春志,田修波.电场增强的阴极弧放电TiCN薄膜结构及性能研究[J].稀有金属材料与工程,2017,46(4):1026-1032.
作者姓名:孔营  马英鹤  李永健  胡健  高峻峰  巩春志  田修波
作者单位:哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室,哈尔滨工业大学 先进焊接与连接国家重点实验室
基金项目:国家自然科学基金(51175118,U1330110)
摘    要:采用一种新型的电场增强阴极弧沉积技术在304不锈钢表面制备了TiCN涂层。研究了附加电极电流对阴极弧放电特性、涂层相结构、截面形貌、耐磨性以及结合力的影响。结果表明:附加电极的引入显著增加真空室内等离子体密度,工件偏流提高近100%;只有超过一定阈值,附加电极电流才能有效减小晶粒尺寸、提高膜层致密性,同时也提高膜基结合力。附加电极电流为30 A时,膜基结合力达到HF1,相对于无附加电极情况样品表面摩擦系数降低了33%,磨痕宽度最小,耐磨性最好。可见电场增强阴极弧放电是一种非常有效的TiCN制备方法。

关 键 词:电场增强  阴极弧沉积  TiCN  结构  表面性能
收稿时间:2014/12/24 0:00:00
修稿时间:2015/5/13 0:00:00

Microstructure and Surface properties of TiCN Films Deposited Using Cathodic Arc Deposition Enhanced by Additional Electric Field
Kong Ying,Ma Ying-he,Li Yong-jian,Hu Jian,Gao Jun-feng,Gong Chun-Zhi and Tian Xiu-bo.Microstructure and Surface properties of TiCN Films Deposited Using Cathodic Arc Deposition Enhanced by Additional Electric Field[J].Rare Metal Materials and Engineering,2017,46(4):1026-1032.
Authors:Kong Ying  Ma Ying-he  Li Yong-jian  Hu Jian  Gao Jun-feng  Gong Chun-Zhi and Tian Xiu-bo
Affiliation:State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology
Abstract:TiCN coatings have been deposited on 304 stainless steel by newly developed cathodic arc deposition enhanced by additional electric field. The effect of the current of additional electrode on cathode arc discharge, film microstructure, cross-sectional morphology, wear resistance and adhesion between film and substrate have been investigated. The experimental results show the plasma density has been substantially increased after introduction of additional electrode in the chamber and the substrate current is improved by nearly 100%. Only a properly higher current of additional electrode may effectively decrease the crystal size and make the film structure much denser, consequently the critical load of deposited films has been enhanced. The sample deposited at a 30A-current of additional electrode possesses the highest adhesion force between film and substrate (HF1), best wear-resistance featured by narrowest wear track. The friction coefficient may decrease by 33% compared to the sample fabricated without the assistance of additional electrode. In summary cathodic arc deposition enhanced by additional electric field is an effective tool to fabricate TiCN films.
Keywords:Electric field enhancement  cathodic arc deposition  TiCN  microstructure  surface properties
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