Asymmetric Bipolar Pulsed DC |
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| Authors: | Jeff Sellers Jürgen Pfähler |
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| Affiliation: | 1. Jeff Sellers, Senior Principal Engineer, ENI.;2. Jürgen Pfähler, Jahrgang 1958, Diplom Wirtschaftsingenieur (FH) seit 1993 bei der Firma ENI Germany, Leinfeld-Echterdingen als Niederlassungsleiter |
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| Abstract: | Summary The use of reactive DC sputtering of insulators from conductive targets has been limited due to the intrinsic problem of target poisoning and the consequent process instabilities. As technology pushes forward, the need to rapidly deposit high quality dielectric films is becoming increasingly important. Asymmetric bi-polar pulsed DC enables existing PVD tools to produce the high quality, low defect dielectric films needed for next generation processes. Typical films produced with asymmetric bipolar pulsed DC reactive sputtering from metallic targets include: Al2O3, AIN, SiO2, SiN, Ta2O5, DLC, BST, TaN, TiN and ITO. |
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