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Growth and Adhesion Enhancement of Diamond Films Deposited on Steel Substrates by a Cr–N Interlayer
Authors:Olga Glozman  Alon Hoffman
Affiliation:Chemistry Department, Solid State Institute and Wolfson Center for Interface Studies, Technion—Israel Institute of Technology, Haifa 32000, Israel
Abstract:Diamond film deposition onto iron-based substrates by chemical vapor deposition methods is complicated by the formation of black carbon or graphitic soot on the substrate surface prior to diamond nucleation and growth, by fast diffusion of carbon into the iron substrate, and by poor adhesion of the deposited film. These complications suggested the use of a buffer layer between the deposited diamond film and the iron-based substrate. We review different methods used to improve the adhesion of diamond film to steel substrates. In particular we describe in detail our own studies which involve the use of a Cr-N interlayer. The use of a chromium nitride interlayer has been found to improve significantly the adhesion of diamond films deposited on ferrous substrates. This is achieved by hindering diffusion processes of carbon and iron, very stable mechanical and chemical bonding between the interlayer and the diamond film, and good adhesion of the interlayer to the steel substrate. We also report on our studies related to residual stress present in the films, as well as a correlation between the interlayer properties and adhesion strength of deposited films.
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