柱弧离子镀和非平衡磁控溅射镀制备Ti-N-C黑色硬质膜

采用柱弧离子镀和中频孪生靶非平衡磁控溅射镀膜技术制备了Ti-N-C多层复合黑色硬质膜.采用轮廊仪扫描电子显微镜(SEM)、分光光度计、显微硬度计等手段研究了所得膜层的各项性能.结果表明,两种工艺都可以获得颜色较深的黑色硬质膜,柱弧离子镀制备黑色硬质膜的效率高、力学性能更好;中频孪生靶非平衡磁控溅射制备的黑色硬质膜表面光滑、颜色更深.

Preparation of Ti- N- C Black Hard Films by Cylindrical Cathode Arc Ion Plating and Medium Frequency Twin Target Unbalanced Magnetron Sputtering

Multi-layer Ti-N-C black hard films were deposited making use of cylindrical cathode arc ion plating and medium frequency twin target unbalanced magnetron sputtering.The morphologies and mechanical properties of the resulting hard films were investigated using a scanning electron microscope,spectrophotometer,and hardness meter.It was found that both the techniques could be well used to deposit deep black Ti-N-C hard films.The deposition efficiency of the cylindrical cathode arc ion plating was higher than that of the medium frequency twin target unbalanced magnetron sputtering,and the Ti-N-C hard film prepared using the former technique had better mechanical properties.At the same time,the black hard film deposited by medium frequency twin target unbalanced magnetron sputtering was smoother and more black as compared to the film deposited by cylindrical cathode arc ion plating.