Atomic nanofabrication using an ytterbium atomic beam |
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Authors: | Ryuzo Ohmukai Shinji Urabe Masayoshi Watanabe |
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Affiliation: | aKansai Advanced Research Center, National Institute of Information and Communications Technology, 588-2 Iwaoka, Nishi-ku, Kobe 651-2492, Japan;bDepartment of Physical Science, Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan |
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Abstract: | Highly parallel and periodically narrow lines of ytterbium (Yb) atoms were successfully produced on a substrate using a near resonant laser light and direct-write atomic nanofabrication. Yb atoms are a promising material for nanofabrication using atom optics particularly due to their electric conductivity, the laser wavelength required for their manipulation, and the vapor pressure required for their fabrication. Collimated 174Yb atoms were channeled into the nodes of an optical standing wave with dipole force and then deposited onto a substrate. We clearly observed a grating pattern of Yb atoms fabricated on a substrate with a line separation of approximately 200 nm after examining the surface of the substrate with an atomic force microscope. This is the first demonstration of nanofabrication using the atom-optical approach with Yb atoms. |
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Keywords: | Atomic nanofabrication Atom optics Ytterbium Optical molasses Channeling |
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